New Stable Top-Hat DOE Designs for 532 nm and 1064 nm
Photonics News No 30
031
The stable top-hat designs combine the nice uniformity of the Top-Hat designs with the flexibility of diffusers. The new designs include a diffractive optical element that creates a 30x30 µm uniform spot from a Ø6 mm 532 nm laser and a 50x50 µm uniform spot from a Ø6 mm 1064 nm laser, that both have a working distance of 50 mm.
Other features of the element include:
- high Transmission Efficiency (close to 100%)
- high Diffraction Efficiency (~95%)
- high Damage Threshold
- AR/AR coated
- made of Fused Silica
Datasheet:
Manufacturer:
Holo-OR Ltd.
